Germanium Dioxide Semiconductor Solutions Through a Capital and Business Alliance with Patentix
First written in FY2024-Q2. 5 of 9 entries say "Dropped", first in 2026-07-30. Latest entry: FY2026.
No other company in this theme has enough history to compare yet.
- FY2026DroppedAnnual reportThis report contains no ongoing references to the capital and business alliance with Patentix, germanium dioxide or the Shiga Semiconductor Research and Development Center. The focus of the next-generation semiconductor R&D policy has shifted to evaluation equipment, SiC and GaN, and MAP.
- FY2025AdvancedAnnual report
「We established the Shiga Semiconductor R&D Center as a research and development base for GeO2, a new next-generation semiconductor material, and together with Patentix株式会社 began full-scale development of thin-film deposition technology and deposition equipment. In August last year, we also reached a basic agreement with Patentix株式会社 under which we would conduct shipment inspections for the paid shipment of GeO2 samples.」
The company and Patentix have moved into full-scale development of GeO2 film-deposition technology and equipment and reached a basic agreement on shipment inspections ahead of paid sample shipments. - FY2024AdvancedAnnual report
「On 14 December 2023, we entered into an agreement with Patentix株式会社 concerning a capital and business alliance and will use this as a platform to expand our business areas by entering the semiconductor manufacturing field. In May 2024, we opened the Shiga Semiconductor R&D Center as a research base for our next-generation semiconductor business.」
The company clearly linked its alliance with Patentix to entry into semiconductor manufacturing and opened the Shiga Semiconductor R&D Center in May 2024. - FY2024-Q3RestatedAnnual report
「This was mainly due to a ¥60,548 thousand increase in “investments and other assets” related to the investment associated with the capital and business alliance with Patentix株式会社 and a ¥49,703 thousand increase in “property, plant and equipment” related to the acquisition of analytical and testing equipment.」
The investment associated with the capital and business alliance with Patentix continues to be reflected as a factor behind the increase in investments and other assets. - FY2024-Q2First statedAnnual report
「To further expand our business areas, we invested ¥50,000 thousand in Patentix株式会社, headquartered in Kusatsu, Shiga Prefecture, in December 2023, laying the groundwork for collaboration. Patentix was the first company in the world to successfully form a rutile-structured germanium dioxide film on silicon carbide. Together with the company, we will develop semiconductor solutions centered on the manufacture of germanium dioxide semiconductor epiwafers, contributing to the creation of future quality.」
The company made a ¥50,000 thousand investment in Patentix in December 2023 and first disclosed collaboration and solution development centered on manufacturing germanium dioxide semiconductor epiwafers.