Launch of New Products and Expansion of the Inspection and Measurement Equipment Lineup
First written in FY2016. 11 of 12 entries say "Advanced", first in FY2017. Latest entry: FY2026.
No other company in this theme has enough history to compare yet.
- FY2026AdvancedAnnual report
「The new products launched as the results of research and development during the consolidated fiscal year were as follows. “PELMIS series EPM200 EUV pellicle particle inspection system” “ACTIS A200HiT series actinic EUV pattern mask defect inspection system” “OPTELICS UXM ultrashort-pulse laser-excited microscope” “MAGICS series M9750/M9751 mask blank defect inspection/review system” “MATRICS X712 series mask defect inspection system”」
Introduced 5 products and series in the areas of EUV pellicles, EUV pattern masks, WBG wafers, mask blanks and general masks, expanding the product lineup. - 2026-03-31AdvancedOther Disclosures
「LASERTEC has commercialized the MATRICS X712 series of mask defect inspection systems to meet inspection needs at mask shops and wafer fabs.」
Commercialized a new series of mask defect inspection systems and expanded its inspection and metrology equipment lineup. CANONICAL THREADS has not been changed. - FY2025AdvancedAnnual report
「The new products launched as the results of research and development during the consolidated fiscal year were as follows. “ABICS E320 series EUV mask blank defect inspection/review system” “PELMIS series EUV pellicle particle inspection system” “SICA108 series SiC wafer defect inspection/review system” “OPTELICS IR IR confocal microscope” “ECCS B520 electrochemical reaction visualization confocal system”」
Launched 5 new products and series in the EUV, SiC wafer, advanced packaging and all-solid-state battery research and inspection fields, expanding the product lineup. - FY2024AdvancedAnnual report
「The new products launched as the results of research and development during the consolidated fiscal year were as follows. “URASHIMA high-brightness EUV plasma light source” “ACTIS A300 series actinic EUV pattern mask defect inspection system” “VIANCA series via-depth measurement system”」
Launched the URASHIMA, ACTIS A300 series and VIANCA series as new products, expanding the product lineup to include EUV light sources, EUV mask inspection and HBM-related measurement. - FY2023AdvancedAnnual report
「The new products launched as the results of research and development during the consolidated fiscal year were as follows.」
Launched the CIRIUS and CIEL series as new products, expanding the product lineup to include internal semiconductor defect inspection and wafer-edge inspection. - FY2022AdvancedAnnual report
「The new products launched as the results of research and development during the consolidated fiscal year were as follows.」
Launched CLIOS G834Advance, CLIOS G800LITE, OPTELICS AI² and MATRICS X9ULTRA as new products, expanding the product lineup to include FPD masks, confocal microscopy and EUV mask inspection. - FY2021AdvancedAnnual report
「The MZ100 mask edge inspection system enables high-sensitivity inspection, review and measurement of the edge areas of EUV and DUV masks.」
Launched the new MZ100 product for the edge areas of EUV and DUV masks, expanding the product lineup into the new functional area of mask-edge inspection, review and measurement. - FY2020AdvancedAnnual report
「The newly developed ACTIS A150 EUV mask defect inspection system is the world's first EUV patterned mask defect inspection system, using the Company's mask pattern inspection technology cultivated over many years together with EUV-based inspection technology.」
Developed ACTIS A150 as a new product, adding a new system to the existing lineup of EUV mask blank and pattern inspection products. - FY2019AdvancedAnnual report
「MAGICS series M9650/M9651 mask blank defect inspection/review systems」
Developed M9650/M9651 as new products, demonstrating support for mask blanks from the 5nm generation onward and substrates for EUV mask blanks, as well as high-sensitivity detection and high throughput. - FY2018AdvancedAnnual report
「The new products launched as the results of research and development during the consolidated fiscal year were as follows.」
Launched and commercialized the CLIOS G10 series for 10.5-generation FPDs, the GALOIS series for GaN wafers and the MATRIX X8 ULTRA series for EUV and conventional photomasks. CLIOS G10 reduced inspection time by 30% compared with previous models. - FY2017AdvancedAnnual report
「The new products launched as the results of research and development during the consolidated fiscal year were as follows.」
Launched and commercialized LX530, M8650/M8651 and ABICS E120. M8650/M8651 doubled the number of beams compared with previous models, halved inspection time and achieved 1.5 times higher sensitivity through high-density scanning. - FY2016First statedAnnual report
「The new products launched as the results of research and development during the consolidated fiscal year were as follows.」
Launched SICA88, EZ300, MPM365gh and the LBIS series, among others. SICA88 was described as having doubled throughput compared with existing models.