Announced details
Foreign-material inspection and quality assurance inspection in mask manufacturing processes, as well as incoming inspection and periodic quality assurance inspection of masks at wafer fabs. Applications include logic, analog, discrete and power devices. Design nodes in the >250 nm to 90 nm class.
High-speed inspection in as little as 22 minutes per mask
In this announcement the company addresses none of Contract Value / Offering price / Impact on Business Performance.
| Item | Details |
|---|---|
| Names of Products / Services Covered | MATRICS X712 Series mask defect inspection system |
| Launch date | 31 March 2026 (announcement date; stated to have been commercialized) |
| Applicable area | Foreign-material inspection and quality assurance inspection in mask manufacturing processes, as well as incoming inspection and periodic quality assurance inspection of masks at wafer fabs. Applications include logic, analog, discrete and power devices. Design nodes in the >250 nm to 90 nm class. |
| Quantitative Effects | High-speed inspection in as little as 22 minutes per mask |
Items this document does not state (14)
These are items the company does not state in this document. We do not leave them blank, nor fill them in from other sources or by inference.
The reasons the company gives
The company's own explanation, not something inferred from the numbers.Mask inspection for design nodes widely used in logic, analog, discrete and power devices requires high sensitivity, short inspection times and low operating costs.