NIKON CORPORATION announced that it has begun accepting orders for the FX-6ASLH FPD exposure system, the world's first system to achieve submicron resolution of 0.85µm. It supports sixth-generation plate sizes, with market launch scheduled for December 2027.
The new FX-6ASLH FPD exposure system announced by NIKON CORPORATION is positioned as the world's first to achieve submicron resolution of 0.85µm. It supports sixth-generation plate sizes and is intended primarily for the manufacture of OLED and liquid-crystal panels for smart devices that require high resolution.
The product incorporates a new illumination optical system using a UV-LED light source, combining resolutions of 0.85µm and 1.0µm. It also accommodates the size of the substrate and is designed to expose the entire plate, taking line width and the spacing between adjacent lines into account.
Overlay accuracy of ±0.18µm or less has been achieved. The system is expected to deliver high yields through a multi-lens system integrating multiple lenses and environmental control. Takt time is 39 seconds per plate under specified conditions, with application to 1,500 × 1,850mm plates envisaged.
Market launch is scheduled for December 2027. The company positions the product as a new system offering higher resolution than its predecessors, in anticipation of demand for sixth-generation plate sizes for small- and medium-sized panels.