LINTEC to build new facility with total floor area of approximately 3,600 sq. m. and investment of approximately ¥2.5 billion, strengthening semiconductor equipment development capabilities (Newswitch)

LINTEC announced plans to construct a new building, investing approximately ¥2.5 billion in a facility with a total floor area of approximately 3600㎡ to strengthen its semiconductor equipment development capabilities.

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The story

LINTEC is proceeding with construction of a new building, developing a facility with a total floor area of approximately 3600㎡. The total investment is expected to be approximately ¥2.5 billion, with the aim of strengthening its semiconductor equipment development structure.

No specific completion date or additional details have been provided in the article at this stage, but the project is intended to improve the company's equipment development capabilities.

At a glance

New building sizeA new building with a total floor area of approximately 3600㎡ will be constructed.

Total investmentThe investment is expected to total approximately ¥2.5 billion.

Development objectiveThe aim is to enhance semiconductor equipment development capabilities.

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