Canon's new FPA-6400ES6a KrF lithography tool, scheduled for launch in early December, has reportedly reached a performance level comparable to ASML's high-end models. However, it is said to be difficult to challenge ASML's stronghold within a short period.
Canon announced that it will launch its new FPA-6400ES6a KrF lithography tool in early December. It will be the company's first KrF product in 10 years and its first KrF scanning tool in 14 years.
The new model is said to be capable of processing 400 wafers per hour, with speed approximately 1.3x higher than that of the previous-generation FPA-6300ES6a. Its overlay accuracy is 4 nanometers, which is described as an industry-leading level among KrF scanning lithography tools supporting 300 mm wafers.
Introducing the new tool will require high-precision integration and validation with existing production lines, and it is considered unlikely that ASML's market position can be easily challenged based on catalogue specifications alone. ASML's KrF tools share commonality with its immersion tools, and additional matching validation may be required during installation.