Komori
Jeol (6951) · InitiativeAdvanced

Investment to improve productivity of multi-beam electron-beam lithography systems

First written in FY2021. 1 of 3 entries say "Restated". Latest entry: FY2024-Q2.

3entries
3years
0from disclosures
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ProgressHeldSoftenedWorseFirst statedFY2021 – FY20232021: 120212022: 020222023: 22023
Same theme, other companies
Productivity improvements for multi-beam electron-beam mask writers and stronger collaboration with IMSA theme 1 companies write about · 0 as a headwind · 1 as a tailwind

No other company in this theme has enough history to compare yet.

Full recordFilings, disclosures and news, newest first
  1. FY2024-Q2AdvancedAnnual report

    「The Company resolved to enter into an agreement to transfer an interest in IMS held by Intel Corporation, acquiring part of Intel Corporation's interest to further strengthen its relationship with IMS in both technology and business. The agreement was entered into on 27 September 2023, and the interest was acquired on 20 October 2023. Acquisition price: US$108,198,851 (¥16,200 million) Ownership interest after acquisition: 2.5%」

    The Company acquired part of Intel Corporation's interest in IMS, its strategic partner for multi-beam electron-beam mask lithography systems, giving concrete form to efforts to strengthen the relationship in both technology and business. The Company also drew down ¥8,000 million in borrowings to fund the acquisition.
  2. FY2023RestatedAnnual report

    「We will continue improving the productivity of multi-beam electron-beam lithography systems brought to market in collaboration with IMS, which has earned high market recognition, and seek to enhance their competitiveness.」

    The investment policy of improving productivity and competitiveness for multi-beam electron-beam lithography systems with IMS remains in place.
  3. FY2021First statedAnnual report

    「We are strengthening investment to improve the productivity of multi-beam electron-beam lithography systems brought to market in collaboration with IMS, which has earned high market recognition.」

    The disclosure first described increased investment to improve the productivity of multi-beam electron-beam lithography systems brought to market in collaboration with IMS.
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