Promotion of the EUV inspection light source business
First written in FY2017. 8 of 22 entries say "Restated". Latest entry: 2026-11-06.
No other company in this theme has enough history to compare yet.
- 2026-11-06WorsenedResults
「EUVリソグラフィマスク検査用EUV光源に関する保守メンテナンスサービス収入が、一部光源の稼働停止により減少し、減収となりました。」
一部光源の稼働停止により、EUV光源の保守メンテナンスサービス収入の減少が続いている。 - FY2026ReframedAnnual report
「We decided to discontinue part of the EUV business, whose earnings efficiency had declined. The EUV light sources currently in operation are expected to cease operation during fiscal 2026. Going forward, we will continue R&D focused primarily on new applications, including semiconductor inspection.」
Part of the EUV light-source business will be discontinued, with operating light sources scheduled to cease operation during fiscal 2026, while R&D has been refocused on new applications such as semiconductor inspection. - 2026-05-14SoftenedResults
「一方で、EUV事業においては現在稼働中のEUVマスク検査用光源の一部終息判断に伴いメンテナンス収入は減少する見込みですが、光学装置事業全体では増収となる見込みです。」
EUV事業では、稼働中の光源の一部終息判断により、将来のメンテナンス収入が減少する見通しが示された。 - FY2026-H1Decline in EUV maintenance revenueAnnual report
「In addition to a decline in maintenance service revenue for EUV light sources for EUV lithography mask inspection, sales of optical alignment equipment for flat-panel displays declined, resulting in lower revenue.」
The decline in maintenance revenue due to lower utilization of EUV light sources continued, while declining sales of optical alignment equipment also weighed on results. - FY2025-H1Decline in EUV maintenance revenueAnnual report
「Although sales of optical alignment equipment and other products for flat-panel displays increased, maintenance service revenue declined due to lower utilization of EUV light sources for EUV lithography mask inspection, resulting in lower revenue.」
In the EUV inspection light-source business, maintenance service revenue declined due to lower utilization of the light sources. Meanwhile, sales of optical alignment equipment and other products increased. - FY2024RestatedAnnual report
「Our EUV light sources have achieved the high operational stability and sufficient performance required to meet end users’ mass-production conditions. We will continue investing in development and focus on maintaining and enhancing our technological advantages, including further improvements in performance and operational stability, while seeking to further reduce running costs.」
The policy of continuing development investment, improving performance and operational stability, and reducing running costs for EUV light sources, based on performance and stable operation meeting mass-production conditions, has been reaffirmed. - FY2024-Q2RestatedAnnual report
「Sales increased, mainly because sales of maintenance services rose as maintenance work increased on EUV light sources for EUV lithography mask inspection sold in the previous fiscal year.」
The pattern of increased maintenance services for units sold in the previous fiscal year amid an adjustment in demand for EUV light-source units has continued. - FY2024-Q1RestatedAnnual report
「Sales increased, mainly because sales of maintenance services rose as maintenance work increased on EUV light sources for EUV lithography mask inspection sold in the previous fiscal year.」
The first-quarter results again showed a pattern in which maintenance services for units sold in the previous fiscal year increased despite an adjustment in demand for EUV light-source units. - FY2023Adjustment in core-unit sales and continued development investmentAnnual report
「Our EUV light sources have achieved the high operational stability and sufficient performance required to meet end users’ mass-production conditions. We will continue investing in development and focus on maintaining and enhancing our technological advantages, including high performance and highly stable operation, while seeking to further reduce running costs, including by extending the service life of replacement parts.」
The required performance and stable operation under mass-production conditions were confirmed, and development investment will continue, while sales of EUV light-source units declined during the current fiscal year due to a temporary adjustment in demand and maintenance services increased. - FY2023-Q3RestatedAnnual report
「Meanwhile, although sales of maintenance services increased for EUV light sources for EUV lithography mask inspection because light sources sold in the previous fiscal year and earlier continued to operate well, sales of the light sources themselves declined as demand entered a temporary adjustment phase.」
Maintenance service sales for previously sold EUV mask inspection light sources increased, while sales of the light sources themselves declined due to a temporary adjustment in demand. - FY2023-Q2RestatedAnnual report
「Meanwhile, although sales of maintenance services increased for EUV light sources for EUV lithography mask inspection because light sources sold in the previous fiscal year and earlier continued to operate well, sales of the light sources themselves declined as demand entered a temporary adjustment phase.」
Maintenance service sales for previously sold EUV inspection light sources increased, while sales of the light sources themselves declined due to a temporary adjustment in demand. - FY2023-Q1Temporary adjustment in EUV light-source salesAnnual report
「Meanwhile, although sales of maintenance services increased for EUV light sources for EUV lithography mask inspection because light sources sold in the previous fiscal year and earlier continued to operate well, sales of the light sources themselves declined as demand entered a temporary adjustment phase.」
In the EUV inspection light-source business, maintenance service sales increased for previously sold light sources, while sales of the light sources themselves declined due to a temporary adjustment in demand. - FY2022Temporary adjustment expected due to extended lead times for componentsAnnual report
「Meanwhile, sales of EUV light sources for EUV lithography mask inspection are expected to remain below assumptions in the fiscal year ending March 2023, as they enter a temporary adjustment phase due to the impact of extended lead times for key components and other factors.」
Sales of light sources for EUV inspection had remained in line with expectations through the current fiscal year, but a temporary adjustment phase and downside to the sales plan are expected in the fiscal year ending March 2023 due to extended lead times for key components. - FY2022-Q3RestatedAnnual report
「Sales related to EUV light sources for EUV lithography mask inspection increased as demand for mass production of next-generation semiconductors grew with advances in EUV lithography technology.」
Sales related to EUV light sources for mask inspection continue to increase, reaffirming commercialization and expanded sales against a backdrop of demand for mass production of next-generation semiconductors. - FY2022-Q2RestatedAnnual report
「Sales of EUV light sources for EUV lithography mask inspection increased as demand for mass production of next-generation semiconductors grew with advances in EUV lithography technology.」
Sales of EUV inspection light sources continue to increase against a backdrop of demand for mass production of next-generation semiconductors, reaffirming progress in commercialization and expanded sales. - FY2022-Q1AdvancedAnnual report
「Sales of EUV light sources for EUV lithography mask inspection increased as demand for mass production of next-generation semiconductors grew with advances in EUV lithography technology.」
Sales of EUV inspection light sources continue to increase against a backdrop of demand for mass production of next-generation semiconductors, indicating progress in commercialization and expanded sales. - FY2021AdvancedAnnual report
「As demonstrated by our presentations of the Company’s EUV light source at the SPIE conference in February 2021 and Photo Mask Japan in April, the Company’s EUV light source achieved the high operational stability and sufficient performance required to meet end users’ initial mass-production conditions.」
The EUV light source for mask inspection is described as having achieved stable operation and performance meeting end users’ initial mass-production conditions, indicating progress from commercialization and expanded sales to support for the initial mass-production stage. - FY2021-Q3RestatedAnnual report
「Sales of EUV light sources for EUV lithography mask inspection increased as demand for mass production of next-generation semiconductors grew with advances in EUV lithography technology.」
Sales of EUV light sources for mask inspection continue to increase against a backdrop of demand for mass production of next-generation semiconductors. - FY2021-Q2AdvancedAnnual report
「Sales of EUV light sources for EUV lithography mask inspection increased as demand for mass production of next-generation semiconductors grew with advances in EUV lithography technology.」
Sales growth is reported for the EUV inspection light source business against a backdrop of demand for mass production of next-generation semiconductors, indicating progress from R&D and commercialization to expanded sales. - FY2020AdvancedAnnual report
「We will continue R&D on our EUV light sources to anticipate customer needs, pursuing higher brightness, greater stability and reliable operation.」
For EUV light sources for mask inspection, continued development toward higher brightness, greater stability and reliable operation is indicated, following progress toward commercialization and increased sales. - FY2019AdvancedAnnual report
「We are developing an Sn LDP EUV light source essential to achieving this objective, with approximately 50 times the brightness of the conventional Xe method. As it is intended for mass-production lines, we are also working on high-reliability development.」
R&D is progressing on an EUV light source for mask inspection, with the technical requirements of the Sn LDP method, approximately 50 times the brightness of the conventional method and high-reliability development. - FY2017First statedAnnual report
「In the optical equipment field of the equipment business, we will steadily promote the new EUV inspection light source business and capture and expand investment opportunities for exposure equipment and other products arising from the advancement of IoT and other technologies.」
The promotion of the EUV inspection light source business is identified for the first time as a new growth opportunity in the optical equipment field.