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Ishihara Chemical (4462) · InitiativeRestated

Development of Plating Technology for Next-Generation Semiconductors and Packaging

First written in FY2016. 5 of 8 entries say "Restated". Latest entry: FY2026.

8entries
11years
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ProgressHeldSoftenedWorseRestatedFY2018-Q3 – FY2019-Q3AdvancedFY20192016: 120162017: 220172018: 120182019: 220192020: 020202021: 020212022: 020222023: 020232024: 020242025: 120252026: 12026
Same theme, other companies
Development of plating technologies and chemical solutions for next-generation semiconductor packagingA theme 1 companies write about · 0 as a headwind · 1 as a tailwind

No other company in this theme has enough history to compare yet.

Full recordFilings, disclosures and news, newest first
  1. FY2026RestatedAnnual report

    「In the electronic components and other industries, we will launch high-value-added products such as plating solutions for high-end semiconductors and expand the market, thereby increasing sales of high-value-added products and gross profit.」

    The company has reaffirmed its policy of launching plating solutions for advanced and high-end semiconductors and expanding the market.
  2. FY2025RestatedAnnual report

    「In the electronic components and other industries, we will launch high-value-added products such as plating solutions for advanced semiconductors and expand the market, thereby increasing sales of high-value-added products and gross profit.」

    The company has reaffirmed its policy of launching high-value-added products, including plating solutions for advanced semiconductors, on the market.
  3. FY2019AdvancedAnnual report

    「In addition, copper plating solutions for wafers compatible with fan-out technology and copper pillar formation performed steadily, supported by mass production in Taiwan and increased production in South Korea.」

    For copper plating solutions for wafers compatible with fan-out technology and copper pillar formation, the report describes specific progress in production, namely mass production in Taiwan and increased production in South Korea.
  4. FY2019-Q3RestatedAnnual report

    「In addition, electroless tin plating solutions for LCD drivers and copper plating solutions for wafers compatible with fan-out technology and copper pillar formation also performed well.」

    Reports strong performance by copper plating solutions for wafers compatible with fan-out technology and copper pillar formation. No new customers or progress in the development stage is indicated.
  5. FY2018-Q3RestatedAnnual report

    「There was also adoption of copper plating solutions for wafers compatible with fan-out technology and copper pillar formation,」

    The adoption of copper plating solutions for wafers compatible with fan-out technology and copper pillar formation is reiterated. Adoption had already been disclosed in the previous quarter, and no new customer or stage milestone is indicated.
  6. FY2018-Q1AdvancedAnnual report

    「Business remained strong in domestic and overseas markets, supported by robust demand for plating solutions for general electronic components used in automotive-related semiconductors and large televisions compatible with 4K and OLED, as well as adoption of copper plating solutions for wafers compatible with fan-out technology in semiconductors.」

    The disclosure states that copper plating solutions for wafers compatible with fan-out technology were adopted, providing a specific adoption record for plating technology for next-generation semiconductors and packages.
  7. FY2017RestatedAnnual report

    「The Group is developing electrolytic copper plating solutions compatible with all manufacturing methods.」

    The company describes a policy of developing electrolytic copper plating solutions compatible with multiple manufacturing methods, including fan-out packaging, as well as tin-based plating solutions for next-generation package substrates.
  8. FY2016First statedAnnual report

    「To meet these needs, we are developing high-performance tin-silver plating processes and other technologies, as well as next-generation bonding materials. To support further increases in density, we are also developing an electrolytic copper plating process for forming pillars beneath tin-based bump electrodes, which has already been adopted by some users.」

    First disclosed. The research and development themes include multiple plating-process developments for tin-based bumps, copper pillars and next-generation package substrates.
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Development of Plating Technology for Next-Generation Semiconductors and Packaging | ISHIHARA CHEMICAL CO.,LTD. (4462) | Komori