Canon, which lost out to ASML in the 1990s, is reportedly demonstrating an innovation based on stamp-based semiconductor technology that could reduce the power consumption of EUV lithography equipment to one-tenth and cut costs by 40%.
In the 1990s, Japan's semiconductor lithography equipment technology is widely believed to have lost out to ASML, leading to a decline in the country's cutting-edge domestic technology.
The article reports that, through a new technology known as "stamp-based semiconductors," Canon may be able to reduce the power consumption of EUV lithography equipment to roughly one-tenth of the conventional level and cut costs by around 40%.
If the innovation reaches the practical implementation stage, it could contribute to restoring the competitiveness of Japan's lithography equipment sector. However, further reports are awaited on the specific implementation timeline, scope of application and comparisons with other companies.