This article reviews the current state and demand trends in Japan’s lighting market for semiconductor applications, its main uses and leading companies, and its outlook.
In the domestic market, semiconductor manufacturing equipment makers, front-end fabs, and inspection equipment companies are the main buyers. Demand remains strong for high-intensity, high-precision light sources for lithography and etching equipment, while the adoption of EUV lithography is driving a shift toward specialized-wavelength lighting. Equipment upgrades and capacity expansions are accelerating against a backdrop of growing demand for automotive and power semiconductors, while rising component costs caused by the weaker yen and the push for automation due to labor shortages are also cited as challenges.
The main applications include oxidation, diffusion, annealing, epitaxy and other processes, each of which requires different optical technologies. Oxidation and diffusion mainly use conventional lamp heating, with limited replacement demand. Annealing is a growth area for laser-based systems that deliver short processing times and high precision, while epitaxy is becoming more sophisticated as demand for SiC and GaN substrates increases.
Ushio, Osram, Iwasaki Electric and others are listed as the main companies involved in the market. The growth areas are identified as annealing, epitaxy and certain technologies in the other category.
Looking ahead, Japan’s market is expected to expand at a compound annual growth rate of 11.5% over the next several years, with high-precision, high-intensity light sources for lithography and inspection processes expected to drive growth. While tighter energy-efficiency regulations, capital investment cycles, and the upgrading of cleanrooms through the construction and expansion of domestic plants are expected to boost demand, uncertainty in the global economy, foreign exchange rates and component supplies may also have an impact.