Komori
Iwatani (8088) · InitiativeFirst stated

Semiconductor and MEMS micromachining technology using chlorine trifluoride gas

First written in FY2018. . Latest entry: FY2018.

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Development of semiconductor and MEMS microfabrication technology using chlorine trifluoride gasA theme 1 companies write about · 0 as a headwind · 1 as a tailwind

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  1. FY2018First statedAnnual report

    「For chlorine trifluoride gas, which is widely used as a cleaning gas for semiconductor manufacturing equipment, we have developed high-precision micromachining technology for semiconductors and microelectromechanical systems (MEMS) through joint research with universities and are proposing it to major semiconductor manufacturers.」

    Through joint research with universities, the company developed micromachining technology for semiconductors and MEMS using chlorine trifluoride gas and is proposing it to major semiconductor manufacturers.
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