Iwatani (8088) · InitiativeAdvanced
Standard adoption of ozone passivation in semiconductor manufacturing equipment
First written in FY2017. 1 of 2 entries say "Advanced", first in FY2019. Latest entry: FY2019.
2entries
3years
0from disclosures
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Standard adoption of ozone passivation technology in semiconductor equipmentA theme 1 companies write about · 0 as a headwind · 1 as a tailwind
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- FY2019AdvancedAnnual report
「As part of our application development for various gases, semiconductor manufacturing equipment equipped with Ozone Booster, which we developed by applying ozone concentration technology, was installed at a major U.S. semiconductor device manufacturer.」
Describes the specific adoption record of ozone-related technology, namely the installation of equipment at a major U.S. semiconductor device manufacturer. - FY2017First statedAnnual report
「We expanded our contract business by achieving the standard adoption by a major semiconductor manufacturing equipment manufacturer of Ozone Passivation, our proprietary technology for modifying metal surfaces using high-concentration ozone gas.」
For the first time, describes the achievement of standard adoption of Ozone Passivation by a major semiconductor manufacturing equipment manufacturer.