Announced details
Fine-circuit formation in advanced semiconductors and nanolithography for next-generation semiconductor device manufacturing
Since 2023, LINTEC has conducted joint research with AIST's Research Center for Advanced Semiconductor on evaluation technologies for pellicles used in EUV exposure equipment and manufacturing process technologies for semiconductor mid-end applications. The companies will continue their comprehensive joint research.
A national research and development agency with the Tsukuba Center Central Site and the Research Center for Advanced Semiconductor. Location, representative, capital and year established: not disclosed.
1-1-1 Higashi, Tsukuba, Ibaraki Prefecture (within the Central Site of the Tsukuba Center, National Institute of Advanced Industrial Science and Technology)
The impact on consolidated results from the current fiscal year onward has not been determined. LINTEC will make a timely disclosure as soon as the matter reaches a stage at which it can be disclosed.
The company does not address Contract Value / Offering price.
National Institute of Advanced Industrial Science and Technology (AIST) website and AIST Research Center for Advanced Semiconductor website
| Item | Details |
|---|---|
| Names of Products / Services Covered | CNT-based pellicle membranes, Pellicles for EUV exposure equipment |
| Counterparty | National Institute of Advanced Industrial Science and Technology (AIST) |
| Counterparty overview | A national research and development agency with the Tsukuba Center Central Site and the Research Center for Advanced Semiconductor. Location, representative, capital and year established: not disclosed. |
| Relationship with the Company | Since 2023, LINTEC has conducted joint research with AIST's Research Center for Advanced Semiconductor on evaluation technologies for pellicles used in EUV exposure equipment and manufacturing process technologies for semiconductor mid-end applications. The companies will continue their comprehensive joint research. |
| Launch date | 1 June 2026 (scheduled opening) |
| Applicable area | Fine-circuit formation in advanced semiconductors and nanolithography for next-generation semiconductor device manufacturing |
| Location | 1-1-1 Higashi, Tsukuba, Ibaraki Prefecture (within the Central Site of the Tsukuba Center, National Institute of Advanced Industrial Science and Technology) |
| Location scale | Approximately 30 full-time employees (planned) |
| Impact on Business Performance | The impact on consolidated results from the current fiscal year onward has not been determined. LINTEC will make a timely disclosure as soon as the matter reaches a stage at which it can be disclosed. |
| Source | National Institute of Advanced Industrial Science and Technology (AIST) website and AIST Research Center for Advanced Semiconductor website |
Items this document does not state (8)
These are items the company does not state in this document. We do not leave them blank, nor fill them in from other sources or by inference.
The reasons the company gives
The company's own explanation, not something inferred from the numbers.As EUV exposure equipment used to form fine circuits in advanced semiconductors becomes more capable, pellicles are required to provide greater heat resistance, durability and light transmittance. LINTEC will accelerate efforts toward the supply of CNT-based pellicle samples, customer evaluations, product development and full-scale production.