Announced details
Photomask defect repair, semiconductor-related fields, lithography
Processing of widths from 40 to 110 nm, repair of 300 nm defects, and evaluation of optical properties after defect repair on 250 nm line-and-space patterns
株式会社ホロン is our consolidated subsidiary
No impact on the performance of our group for the fiscal year ending March 2027
The company does not address Contract Value / Offering price.
Presentation materials from SPIE Photomask Technology + Extreme Ultraviolet Lithography 2026, Introduction to Photomask Technology
| Item | Details |
|---|---|
| Names of Products / Services Covered | Photomask defect repair equipment equipped with an SEM column featuring aberration correction |
| Relationship with the Company | 株式会社ホロン is our consolidated subsidiary |
| Launch date | Research results were presented at a conference held from 8 to 11 September 2026 (completed) |
| Applicable area | Photomask defect repair, semiconductor-related fields, lithography |
| Quantitative Effects | Processing of widths from 40 to 110 nm, repair of 300 nm defects, and evaluation of optical properties after defect repair on 250 nm line-and-space patterns |
| Impact on Business Performance | No impact on the performance of our group for the fiscal year ending March 2027 |
| Source | Presentation materials from SPIE Photomask Technology + Extreme Ultraviolet Lithography 2026, Introduction to Photomask Technology |
Items this document does not state (11)
These are items the company does not state in this document. We do not leave them blank, nor fill them in from other sources or by inference.
The reasons the company gives
The company's own explanation, not something inferred from the numbers.This was driven by the need to improve photomask yields and growing demand for repair accuracy and shape fidelity as the adoption of curved patterns expands.