Development of a New Nickel-Selective Etchant
First written in FY2018. 4 of 5 entries say "Advanced", first in FY2019. Latest entry: FY2023.
No other company in this theme has enough history to compare yet.
- FY2023AdvancedAnnual report
「The WO etching technology and white anodizing technology for which we have conducted basic research have completed the basic research stage, and we are promoting market awareness through presentations at trade shows, academic conferences and other events.」
Etching and white anodizing technologies completed the basic research stage and moved to the stage of building market awareness through trade shows and academic conferences. - FY2021AdvancedAnnual report
「In particular, we developed etching technology for molybdenum, which is being studied for next-generation high-resolution display wiring, and reached the stage of evaluating samples.」
Etching technology for molybdenum progressed to the sample evaluation stage. - FY2020AdvancedAnnual report
「We are advancing development of selective etching technology for EN plating as a next-generation seed-layer remover, and are nearing commercialization.」
Selective etching technology progressed from the initial development stage to a stage approaching commercialization. - FY2019AdvancedAnnual report
「We also began developing selective etching technology for difficult-to-etch materials, including MO and TI, which are in strong demand in the electronics industry, particularly power electronics, with the aim of keeping pace with next-generation technologies.」
In etching chemical development, work began not only on a nickel-selective etchant but also on selective etching technology for difficult-to-etch materials. - FY2018First statedAnnual report
「Beginning this fiscal year, we strengthened our etching-chemical development structure and began developing a new nickel-selective etchant.」
The company strengthened its etching-chemical development structure and began developing a new nickel-selective etchant.