Customer qualification and development of mask blanks for the 10nm and 7nm generations
First written in FY2016. 14 of 20 entries say "Restated". Latest entry: FY2024.
0 other companies' latest entry also says "Advanced".
- FY2024AdvancedAnnual report
「EUV blanks have also entered mass production.」
The company has progressed from developing next-generation EUV blanks to the stage where EUV blanks have entered mass production. - FY2024-Q3RestatedAnnual report
「There were no material changes in the status of the Group's research and development activities during the cumulative third quarter.」
The company states that there have been no material changes to customer qualification and mass-production shipments of mask blanks or development of next-generation products. - FY2024-Q2RestatedAnnual report
「There were no material changes in the status of the Group's research and development activities during the cumulative second quarter.」
The company states that there have been no material changes to customer qualification and mass-production shipments of mask blanks or development of next-generation products. - FY2023AdvancedAnnual report
「Qualification by major customers of highly radiation-resistant ArF halftone blanks and newly structured blanks for the 7nm design rule has been completed, and mass-production shipments have begun. The company is currently focusing on development of EUV blanks for 5nm to 3nm and below.」
While maintaining the completion of qualification and the start of mass-production shipments for products for 7nm, the company has broadened its development focus to EUV blanks for 5nm to 3nm and below. - FY2023-Q3RestatedAnnual report
「There were no material changes in the status of the Group's research and development activities during the cumulative third quarter.」
The company states that there have been no material changes to customer qualification and mass-production shipments of mask blanks or development of next-generation products. - FY2023-Q2RestatedAnnual report
「There were no material changes in the status of the Group's research and development activities during the cumulative second quarter.」
The company states that there have been no material changes to customer qualification and mass-production shipments of mask blanks or development of next-generation products. - FY2022AdvancedAnnual report
「Qualification by major customers of highly radiation-resistant ArF halftone blanks and newly structured blanks for the 7nm design rule has been completed, and mass-production shipments have begun. The company is currently focusing on development of EUV blanks for 5nm and below.」
The company confirms that qualification by major customers and mass-production shipments of products for 7nm have been completed and begun, respectively, and has advanced its development focus to EUV blanks for 5nm and below. - FY2022-Q1RestatedAnnual report
「There were no material changes in the status of the Group's research and development activities during the cumulative first quarter.」
The company states that there have been no material changes to its R&D activities related to customer qualification and development of mask blanks for the 10nm and 7nm generations. - FY2021-Q1RestatedAnnual report
「There were no material changes in the status of the Group's research and development activities during the cumulative first quarter.」
The company states that there have been no material changes to its R&D activities related to customer qualification and development of mask blanks for the 10nm and 7nm generations. - FY2020-Q3RestatedAnnual report
「There were no material changes in the status of the Group's research and development activities during the cumulative third quarter.」
The company states that there have been no material changes to its R&D activities related to customer qualification and development of mask blanks for the 10nm and 7nm generations. - FY2020-Q2RestatedAnnual report
「There were no material changes in the status of the Group's research and development activities during the cumulative second quarter.」
The company states that there have been no material changes to its R&D activities related to customer qualification and development of mask blanks for the 10nm and 7nm generations. - FY2019AdvancedAnnual report
「Qualification by major customers of highly radiation-resistant ArF halftone blanks and newly structured blanks for the 7nm design rule has been completed, and mass-production shipments have begun. The company is currently focusing on development for the 5nm generation.」
Qualification of mask blanks for the 7nm design rule by major customers has been completed and mass-production shipments have begun. The development focus has shifted to the 5nm generation. - FY2019-Q3RestatedAnnual report
「There were no material changes in the status of the Group's research and development activities during the cumulative third quarter.」
The company states that there have been no material changes to its R&D activities related to customer qualification and development of mask blanks for the 10nm and 7nm generations. - FY2019-Q2RestatedAnnual report
「There were no material changes in the status of the Group's research and development activities during the cumulative second quarter.」
The company states that there have been no material changes to its R&D activities related to customer qualification and development of mask blanks for the 10nm and 7nm generations. - FY2018AdvancedAnnual report
「Qualification of highly radiation-resistant ArF halftone blanks and newly structured blanks for the 10nm design rule by major customers has been completed, and mass-production shipments have begun. The company is currently focusing on development for the 7nm generation.」
Qualification of mask blanks for 10nm by major customers has been completed, and mass-production shipments have begun. The development focus has shifted to the 7nm generation. - FY2018-Q3RestatedAnnual report
「There were no material changes in the status of the Group's research and development activities during the cumulative third quarter.」
The company states that there have been no material changes to its R&D activities related to customer qualification and development of mask blanks for the 10nm and 7nm generations. - FY2018-Q2RestatedAnnual report
「There were no material changes in the status of the Group's research and development activities during the cumulative second quarter.」
The company states that there have been no material changes to its R&D activities related to customer qualification and development of mask blanks for the 10nm and 7nm generations. - FY2018-Q1RestatedAnnual report
「There were no material changes in the status of the Group's research and development activities during the cumulative first quarter.」
The company states that there have been no material changes to its R&D activities related to customer qualification and development of mask blanks for the 10nm and 7nm generations. - FY2017RestatedAnnual report
「Shipments of samples of highly radiation-resistant ArF halftone blanks and newly structured blanks for the 10nm design rule to major customers have begun, and customer qualification is in its final stage. Going forward, the company will focus on development for the 7nm generation.」
The company continues its policy of maintaining final-stage customer qualification and sample shipments for products for 10nm, while shifting to development for the 7nm generation. - FY2016First statedAnnual report
「Shipments of samples of highly radiation-resistant ArF halftone blanks and newly structured blanks for the 10nm design rule to major customers have begun, and customer qualification is in its final stage. Going forward, the company will focus on development for the 7nm generation.」
The company reports progress in sample shipments and customer qualification for products for 10nm, and a shift to development for the 7nm generation.